High-Efficiency Planarization of SiC Wafers by Water-CARE (Catalyst-Referred Etching) Employing Photoelectrochemical Oxidation

High-Efficiency Planarization of SiC Wafers by Water-CARE (Catalyst-Referred Etching) Employing Photoelectrochemical Oxidation

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Veröffentlicht in:European Conference on Silicon Carbide and Related Materials (12. : 2018 : Birmingham) Silicon carbide and related materials 2018
1. Verfasser: Kida, H. (VerfasserIn)
Weitere Verfasser: Tho, D. (VerfasserIn), Bui, P. V. (VerfasserIn), Isohashi, A. (VerfasserIn), Ohnishi, R. (VerfasserIn), Matsuyama, S. (VerfasserIn), Yamauchi, K. (VerfasserIn), Sano, Y. (VerfasserIn)
Pages:2018
Format: UnknownFormat
Sprache:eng
Veröffentlicht: 2019
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