0.35~0.3 μm Optical Lithography

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (47 : 1994 : Tokio) 47. Handōtai Shuseki Kairo Gijutsu Shinpojiumu Kōen Ronbunshū
1. Verfasser: Kasama, K. (VerfasserIn)
Pages:47
Format: UnknownFormat
Sprache:jpn
Veröffentlicht: 1994
Schlagworte:
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Titel Jahr Verfasser
Single Layer Resist with Adamantylmethacrylates for 193nm Lithography 1994 Takechi, S.
0.35~0.3 μm Optical Lithography 1994 Kasama, K.
Electron Beam Lithography on the Heavy Metal Substrate 1994 Uchiyama, S.
Self-Aligned Rapid Thermal Nitridation of TiSi2 in NH3 Ambient as a Diffusion Barrier Layer for Selective CVD-Al Contact Plag Formation 1994 Shinriki, H.
NOR-type Flash Memory Cell Technology for 64M and Beyond 1994 Kubota, T.
Review of the NAND-EEPROM Technology 1994 Shirota, R.
Positive Photoresist for High Speed Bump Plating 1994 Saito, K.
Electoron Beam Direct Writing Technology for Future ULSI Fabrication 1994 Okazaki, S.
Controllability of Pattern Sizes on a Ultra-high-sensitivity Negative-type Chemical Amplification EB Resist 1994 Yamamoto, J.
Impact of Phase Shift Deviation on Lithographic Performance in Attenuated Phase-Shifting Mask 1994 Hanawa, T.
Enhanced Hot-Carrier Degradation Due to Water-Related Species in Plasma Enhaced TEOS Oxide 1994 Yamaha, T.
Annihilation Mechanism of Near-surface Oxygen Precipitates in Silicon Wafer 1994 Yamada, N.
Present State and Future Prospect of Flash Memory Technology Issues for Low Voltage Operation 1994 Ajika, N.
A New Flash Memory Technology using an Ultra-Thin Floating Gate 1994 Hakozaki, K.
Sub-quarter Micron Lithography by Surface Modification Process 1994 Matsuo, T.
Environmental Stability of KrF Positive Chemically Amplified Resist with an Organic Base 1994 Kawai, Y.
The Development of Practical New Off-axis Illumination Technique 1994 Uematsu, M.
Carrier Lifetime Evaluation in Subsurface of Silicon Wafer: Application to Epitaxial-layer Evaluation 1994 Hayamizu, Y.
The Perspective of MONOS Transistor as a Future Flash Memory 1994 Yamagishi, M.
0.113 μm L&S Patterning using ArF Excimer Laser 1994 Ushioda, J.
Alle Artikel auflisten