Interface Instability of Poly-Si Gate Al203/SiO2 MOSFETs

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Veröffentlicht in:Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (65 : 2003 : Tokio) Handōtai, Shuseki-Kairo-Gijutsu-65.-Shinpojiumu-kōen-ronbunshū
1. Verfasser: Kim, W. S. (VerfasserIn)
Weitere Verfasser: Kawahara, T. (VerfasserIn), Itoh, H. (VerfasserIn), Horiuchi, H. (VerfasserIn), Muto, A. (VerfasserIn), Maeda, T. (VerfasserIn), Mitsuhashi, R. (VerfasserIn), Torii, K. (VerfasserIn), Kitajima, H. (VerfasserIn)
Pages:65
Format: UnknownFormat
Sprache:jpn
Veröffentlicht: 2003
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