Effect of Surface Chemistry on Ruthenium Wet Etching

Effect of Surface Chemistry on Ruthenium Wet Etching

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Veröffentlicht in:International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV
1. Verfasser: Le, Q. T. (VerfasserIn)
Weitere Verfasser: Kesters, E. (VerfasserIn), Doms, M. (VerfasserIn), Sánchez, E. A. (VerfasserIn)
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Sprache:eng
Veröffentlicht: 2021
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