Increasing Laser-Doping Depth of Al in 4H-SiC by Using Expanded-Pulse Excimer Laser

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:European Conference on Silicon Carbide and Related Materials (12. : 2018 : Birmingham) Silicon carbide and related materials 2018
1. Verfasser: Ikeda, A. (VerfasserIn)
Weitere Verfasser: Shimokawa, T. (VerfasserIn), Ikenoue, H. (VerfasserIn), Asano, T. (VerfasserIn)
Pages:2018
Format: UnknownFormat
Sprache:eng
Veröffentlicht: 2019
Schlagworte:
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Titel Jahr Verfasser
Tracking of the Growth Interface during PVT-Growth of SiC Boules Using a X-Ray Computed Tomography Setup 2019 Uhlmann, M. Arzig, M. Salamon, N.
Modified Hot-Zone Design for Large Diameter 4H-SiC Single Crystal Growth 2019 Choi, J. W. Choi, J. G. Kim, B. K. Jang, S. K. Ko, M. O. Kyun, J. D. Seo, K. R. Ku, J. M.
New Materials for Semi-Insulating SiC Single Crystal Growth by PVT Method 2019 Chen, J. M. Choi, C. Y. Lee, D. S. Kim, M. S. Park, Y. S. Jang, W. J. Lee, W. Fan, H. Qu, AF X. F.
Application of Defect Conversion Layer by Solution Growth for Reduction of TSDs in 4H-SiC Bulk Crystals by PVT Growth 2019 Kato, N. Komatsu, T. Mitani, Y. Hayashi, H. Suo, T.
Study on Dislocation Behaviors during PVT Growth of 4H-SiC 2019 Seo, I. G. Yeo, T. H. Eun, J. Y. Kim, S. S. Lee, H. S.
Solution Growth of 4-Inch Diameter SiC Single Crystal Using Si-Cr Based Solvent 2019 Kishida, K. Kusunoki, Y.
Repeatability of Epitaxial Growth of n-Type 4H-SiC Films by High Speed Wafer Rotation Vertical CVD Tool 2019 Suzuki, Y. Daigo, A. Ishiguro, S. Ishii, Y. Moriyama, K.
Influence of Substrate Properties on the Defectivity and Minority Carrier Lifetime in 4H-SiC Homoepitaxial Layers 2019 Kallinger, B.
Basal Plane Dislocation Conversion Enhancement in 4H-SiC Homo-Epitaxial Layers by Ion Implantation into the Wafer 2019 Hóchbauer, C. Heidorn. R. Esteve. T.
New SiC Epitaxial Growth Process with up to 100% BPD to TED Defect Conversion on 150mm Hot-Wall CVD Reactor 2019 Heidorn, T. Hôchbauer, C.
Novel Carbon Treatment to Create an Oriented 3C-SiC Seed on Silicon 2019 Zielinski, M.
Evaluation of the Impact of Al Atoms on SiO2/ SiC Interface Property by Using 4H-SiC n*-Channel Junctionless MOSFET 2019 Shimura, H. Takeda, T. Hosoi, T.
Subthreshold Drain Current Hysteresis of Planar SiC MOSFETs 2019 Asllani, B.
First Principles Study of the Influence of the Local Steric Environment on the Incorporation and Migration of NO in a-SiO2 2019 Cottom, M. V. Mistrv J.
Sub-nm-Scale Depth Profiling of Nitrogen in NO- and N2-Annealed Si02/4H-SiC(0001) Structures 2019 Moges, K.
Characterization of Near-Interface Traps at Dielectric/SiC Interfaces Using CCDLTS 2019 Jayawardhena, I.
Observation of Dislocation Conversion in 4H-SIC Epitaxial Wafer by Mirror Projection Electron Microscopy 2019 Miyaki, T. Isshiki, T. Sato, M. Hasegawa, K. Ohira, K. Kobayashi, A.
Dynamics Analysis of Single Shockley Stacking Fault Expansion in 4H-SiC P-i-N Diode Based on Free Energy 2019 Kano, A.
Analysis of Basal Plane Dislocation Dynamics in 4H-SiC Crystals during High Temperature Treatment 2019 Raghothamachar, B.
Deep Electronic Levels in n-Type and p-Type 3C-SiC 2019 Scholer, M.
Alle Artikel auflisten