Thermal Silicidation of Ni/SiGe and Characterization of Resulting Silicide Films Using Raman Spectroscopy and X-ray Diffraction

Thermal Silicidation of Ni/SiGe and Characterization of Resulting Silicide Films Using Raman Spectroscopy and X-ray Diffraction

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Veröffentlicht in:Pacific Rim Meeting on Electrochemical and Solid State Science (2020 : Online) (9.) SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 9
1. Verfasser: Yoo, W. S. (VerfasserIn)
Weitere Verfasser: Kang, K. (VerfasserIn), Ishigaki, T. (VerfasserIn), Kim, J. G. (VerfasserIn), Hasuike, N. (VerfasserIn), Harima, H. (VerfasserIn), Yoshimoto, M. (VerfasserIn)
Pages:9
Format: UnknownFormat
Sprache:eng
Veröffentlicht: 2020
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