Stabilizing Dielectric Constants of Fluorine Doped SiO2 (SiOF) Fims by N2O Plasma Annealing

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Veröffentlicht in:Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (48 : 1995 : Tokio) 48. Handōtai Shuseki Kairo Gijutsu Shinpojiumu Kōen Ronbunshū
1. Verfasser: Takeishi, S. (VerfasserIn)
Weitere Verfasser: Kudoh, H. (VerfasserIn), Shinohara, R. (VerfasserIn), Tsukune, A. (VerfasserIn), Harada, H. (VerfasserIn), Miyazawa, H. (VerfasserIn), Sato, Y. (VerfasserIn), Yamada, M. (VerfasserIn)
Pages:48
Format: UnknownFormat
Sprache:jpn
Veröffentlicht: 1995
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