A Study of TiN Metal Gate Electrodes Formed by Divided CVD Technique for p-MISFETs

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Veröffentlicht in:	Handōtai, Shuseki-Kairo-Gijutsu-70.-Shinpojiumu-kōen-ronbunshū
1. Verfasser:	Sakashita, S. (VerfasserIn)
Weitere Verfasser:	Kawahara, T. (VerfasserIn), Mizutani, M. (VerfasserIn), Inoue, M. (VerfasserIn), Yamanari, S. (VerfasserIn), Nishida, Y. (VerfasserIn), Mori, K. (VerfasserIn), Murata, N. (VerfasserIn), Honda, K. (VerfasserIn), Tsuchimoto, J. (VerfasserIn), Yugami, J. (VerfasserIn), Fujiwara, K. (VerfasserIn)
Pages:	70
Format:	UnknownFormat
Sprache:	jpn
Veröffentlicht:	2006
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