Effect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV
1. Verfasser:	Han, S. Y. (VerfasserIn)
Weitere Verfasser:	Yerriboina, N. P. (VerfasserIn), Sahoo, B. N. (VerfasserIn), Kang, B. K. (VerfasserIn), Klipp, A. (VerfasserIn), Park, J. G. (VerfasserIn)
Format:	UnknownFormat
Sprache:	eng
Veröffentlicht:	2021
Schlagworte:
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Bestellen

Titel	Jahr	Verfasser
Direct Analysis of Ultra Trace Metallic Particles in NH3 and HCl Gases by Gas Exchange Device (GED)-ICP-MS	2021	Kawabata, K.
Towards Si-Cap-Free SiGe Passivation: Impact of Surface Preparation on Low-Pressure Oxidation of SiGe	2021	Wostyn, K.
Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions	2021	Dorp, D. H. van
Highly Selective Etching between Different Oxide Films by Vapor Phase Cleaning	2021	Nishihara, K.
Kinetic Study on the Si3N4 Etching in Superheated Water	2021	Son, C.
Challenges and Solutions of Replacement Metal Gate Patterning to Enable Gate-all-Around Device Scaling	2021	Oniki, Y.
High Performance, Eco-Friendly SPM Cleaning Technology Using Integrated Bench-Single Wafer Cleaning System	2021	Chen, F. P.
Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces	2021	Ueda, D.
Simulation of Rayleigh Bubble Growth near a No-Slip Rigid Wall	2021	Tanaka, T.
Visualization of Acoustic Waves and Cavitation in Ultrasonic Water Flow	2021	Usui, H.
Interaction between Free-Surface Oscillation and Bubble Translation in a Megasonic Cleaning Bath	2021	Katano, Y.
Study on Uniform Deposition on 300 mm Silicon Wafer with Sub-100 nm Sized Particles for Cleaning Application	2021	Lee, S.
Effect of Viscosity on Ceria Abrasive Removal in the Buffing CMP Process	2021	Kim, J.
Effect of Surface Chemistry on Ruthenium Wet Etching	2021	Le, Q. T.
Cl-Containing Microplastics from the Environment	2021	Knotter, D. M.
Experimental Wafer Carrier Contamination Analysis and Monitoring in Fully Automated 300 mm Power Production Lines	2021	Zängle, C.
Wet Chemical Cleaning of Organosilane Monolayers	2021	Hinckley, A. P.
Si1-XGeX Selective Etchant for Gate-All-Around Transistors	2021	Harada, K.
GaN MOS Structures with Low Interface Trap Density (Invited)	2021	Chu, R. M.
Formulation and Evaluation of Diluted Sulfuric-Peroxide-HF (DSP+) Mixtures for Cleaning High-Aspect Ratio Contacts in 3D NAND	2021	An, K. H.

Alle Artikel auflisten