On the Origin of Charge Compensation in Aluminum-Implanted n-Type 4H-SiC by Analysis of Hall Effect Measurements

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Veröffentlicht in:European Conference on Silicon Carbide and Related Materials (12. : 2018 : Birmingham) Silicon carbide and related materials 2018
1. Verfasser: Weisse, J. (VerfasserIn)
Weitere Verfasser: Sledziewski, M. Hauck. T. (VerfasserIn), Krieger, M. (VerfasserIn), Bauer, A. (VerfasserIn), Mitlehner, H. (VerfasserIn), Frey, L. (VerfasserIn), Erlbacher, T. (VerfasserIn)
Pages:2018
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Sprache:eng
Veröffentlicht: 2019
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