WET CLEANS AND SURFACE PREPARATION FOR AUGMENTED REALITY (AR) DEVICE FABRICATION: CHALLENGES AND NOVEL TECHNOLOGY DEVELOPMENTS

WET CLEANS AND SURFACE PREPARATION FOR AUGMENTED REALITY (AR) DEVICE FABRICATION: CHALLENGES AND NOVEL TECHNOLOGY DEVELOPMENTS

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Veröffentlicht in:Surface Preparation and Cleaning Conference (2022 : Chandler, Ariz.) 2022 Surface Preparation and Cleaning Conference
1. Verfasser: Oriero, D. (VerfasserIn)
Pages:2022
Format: UnknownFormat
Sprache:eng
Veröffentlicht: 2023
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Titel Jahr Verfasser
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SINGLE WAFER PATTERN COLLAPSE EVALUATIONS 2023 Zu, X.
CORRELATION BETWEEN AEROSOLIZATION BASED METROLOGY AND ENHANCED SURFACE SCANNING 2023 Oberreit, D.
HYDROXYLAMINE FREE FORMULATION DEVELOPMENT FOR POST ETCH RESIDUE CLEANING 2023 Sun, L.
SUSTAINABLE, HIGHLY-EFFICIENT WATER-BASED ADN NMP-FREE THROUGH SILICON VIAS CLEANING FOR QUANTUM COMPUTER INTERCONNECTS INTREGRATION 2023 Breul, A.
WET CHEMICAL ETCHING OF SI1-XGEX IN HNO3: HF: H2O 2023 Zhang, H.
A NOVEL SELECTIVE ADSORPTION POLYMER TO SILICON NITRIDE ENABLES ETCHING SELECTIVITY CONTROL IN HF AND BHF ETCHING 2023 Mohcida, K.
DIFFUSING CHEMISTRY INTO HIGH ASPECT-RATIO MICROSTRUCTURES THROUGH VACUUM TECHNOLOGY 2023 Kashkoush, I.
DEVELOPMENT OF UV-ASSISTED ELECTROCHEMICAL ETCHING 2023 Higuchi, R.
WET CLEANS AND SURFACE PREPARATION FOR AUGMENTED REALITY (AR) DEVICE FABRICATION: CHALLENGES AND NOVEL TECHNOLOGY DEVELOPMENTS 2023 Oriero, D.
CHARACTERIZATION OF IMPURITIES FROM INCOMING PVA BRUSH FOR SUB 10 NM POST CMP CLEANING PROCESS 2023 Han, K.
SUSTAINABLE SOLVENT METAL LIFT-OFF FOR COMPOUND SEMICONDUCTOR FABRICATION WITH IMPROVED MANUFACTURABILITY 2023 Waduge, P.
RU POST ETCH RESIDUE REMOVAL BY WET CLEANS 2023 Kumari, S.
SIGE SELECTIVE ETCH FOR THE FORMATION OF DIELECTRIC ISOLATIONS IN MONOLITHIC CFET 2023 Gowda, P.
NANOSHEET RMG WORK-FUNCTION METAL PATTERNING TOWARDS CFET 2023 Lai, J.
SURFACE NANOPARTICLE MONITORING FOR PLASMA ETCHING CHAMBER COMPONENTS USING SINGLE PARTICLE - ICP-MS 2023 Mey, L.
NANOLIFT PARTICLES REMOVAL PROCESS – POLYMER FILM STRUCTURE STUDY AND FILM QUEUING INFLUENCE ON REMOVAL 2023 Mercadier, T.
ATOMIC LAYER ETCHING AND CLEANING OF AL2O3 FROM GOLD SUBSTRATES MEASURED USING IN SITU AUGER ELECTRON SPECTROSCOPY 2023 Cavanagh, A.
HIGHLY SELECTIVE DRY ETCHING PROCESS FOR THE REMOVAL OF SIGE LAYERS FOR THE ENABLEMENT OF STACKED NANOSHEET GATE-ALL-AROUND TRANSISTOR ARCHITECTURES 2023 Otto, I.
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