FORMATION OF ZrSiz AND ITS APPLICATION TO LSI CONTACTS

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Bibliographische Detailangaben
Veröffentlicht in:	Handōtai, Shūseki Kairo Gijutsu Shinpojiumu (27. : 1984 : Tokio) Handōtai, Shūseki Kairo Gijutsu Dai 27kai Shinpojiumu
1. Verfasser:	Muto, M. (VerfasserIn)
Weitere Verfasser:	Kato, T. (VerfasserIn), Ito, T. (VerfasserIn)
Pages:	27
Format:	UnknownFormat
Sprache:	jpn
Veröffentlicht:	1984
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Titel	Jahr	Verfasser
TRENCH ISOLATION FOR SIT IMAGE SENSOR	1984	Ohta, Y.
A NOVEL NEGATIVE RESIST FOR ELECTRON BEAM AND X-RAY WITH HIGH RESOLUTION ANDHIGH THERMAL STABILITY	1984	Atoda, N.
ANALISYS OF CROSS-SECTIONAL PROFILES OF RESIST PATTERNS IN THE DOUBLE EXPOSURE METHOD (DEM) LITHOGRAPHY	1984	Hirai, Y.
A 440-GATE SOI/CMOS GATE ARRAY BY LASER RECRYSTALLIZATION	1984	Izawa, T.
A NEW FILM CARRIER ASSEMBLY TECHNOLOGY “TRANSFERRED BUMP-TAB TECHNOLOGY : PART-II"	1984	Hatada, K.
CRYSTAL PERFECTION OF SILICON SINGLE CRYSTALS GROWN BY THE MAGNETIC-FIELD- APPLIED CZOCHRALSKI METHOD	1984	Kawado, S.
LIFT-OFF TECHNIQUE USING NEGATIVE DEEP-UV RESIST, LMR Ar	1984	Yamashita, Y.
A 5 V-ONLY 256 BIT CMOS NONVOLATILE RAM	1984	Kamiya, M.
FORMATION OF ZrSiz AND ITS APPLICATION TO LSI CONTACTS	1984	Muto, M.
BREAKDOWN IN SILICON DIOXIDES - CORRELATION WITH Fe AND Cu PRECIPITATES	1984	Ohsawa, A.
MICROMETER-SCALE Cr FILM CVD WITH kHz REPETITION RATE UV LIGHT PULSES	1984	Morishige, Y.
NH3 PLASMA TREATMENT ON THE Ga As SURFACE	1984	Shimada, M.
LOW LEAKAGE CHARACTERISTICS OF POLYSILICON OXIDE GROWN BY ARGON DILUTE OXIDATION	1984	Mikata, Y.
METHACRYLATED SILICONE-BASED NEGATIVE RESISTS (MSNR)	1984	Tanaka, A.
INVESTIGATION OF MULTILAYER RESIST	1984	Youda, S.
A NEW COMPOSITE Mo GATE PROCESS TECHNOLOGY FOR VLSI	1984	Yamauchi, Y.
TRENCH-WELL ISOLATION TECHNOLOGY APPLIED TO SUB-MICRON CMOS	1984	Nagakubo, Y.
AN IMPROVED LOCOS TECHNOLOGY USING THIN OXIDE AND POLYSILICON BUFFER LAYERS	1984	Hoshi, N.
SIMULATION FOR ETCHING PATTERN PROFILES	1984	Matsui, T.