New Chemically Amplified Positive Resist for Electron Beam Lithography

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Veröffentlicht in:Handōtai, Shūseki Kairo Gijutsu Shinpojiumu (40. : 1991 : Tokio) Handōtai, Shūseki Kairo Gijutsu Dai 40kai Shinpojiumu
1. Verfasser: Hashimoto, K. (VerfasserIn)
Weitere Verfasser: Tani, Y. (VerfasserIn), Endo, M. (VerfasserIn), Sasago, M. (VerfasserIn)
Pages:40
Format: UnknownFormat
Sprache:jpn
Veröffentlicht: 1991
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