Dependence of Line Width on Pattern-Pitch in Chemically Amplified Resist

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (50 : 1996 : Tokio) 50. Handōtai Shuseki Kairo Gijutsu Shinpojiumu Kōen Ronbunshū
1. Verfasser: Usujima, A. (VerfasserIn)
Weitere Verfasser: Oikawa, A. (VerfasserIn), Kaimoto, Y. (VerfasserIn), Nakagawa, K. (VerfasserIn)
Pages:50
Format: UnknownFormat
Sprache:jpn
Veröffentlicht: 1996
Schlagworte:
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Titel Jahr Verfasser
Cooperative Efforts Toward 300mm Technology 1996 Komiya, H.
Dependence of Line Width on Pattern-Pitch in Chemically Amplified Resist 1996 Usujima, A.
Wafer Characteristics and Crystal Quality for 300mm Wafer 1996 Yamamoto, H.
Effect of Gettering on Device Characteristics 1996 Kitano, T.
Tungsten Etchback in a MORI High Density Plasma Etcher 1996 Ha, J. H.
Simulation Study on Control Mechanism of Profile and Dimension ın Poly-Silicon Gate Etching 1996 Ohkuni, K. Harafuji. M.
RIE Process Limit Consideration Through Profile Simulation 1996 Park, J. S.
The Semiconductor Roadmap: A Guide for Industry Cooperation 1996 Owens, Jim
Current Status and Subjects of Half-Tone Phase Shift Mask for KrF Lithography 1996 Mohri, H.
SiO2 Selective Etch Mechanism in High-Aspect-Ratio Holes 1996 Sekine, M.
Present Status and Issues of KrF Excimer Laser Lithography 1996 Hashimoto, T.
Overview of KrF Excimer Laser Chemically Amplified Resist Process 1996 Endo, M.
New Concept Materials for ArF Lithography Resists 1996 Saitoh, M.
Development of KrF Excimer Laser Stepper 1996 Hata, H.
Detection of Fe Impurities Gettered at the Polycrystalline-Si Grain Boundary 1996 Honda, K.
Automatic Optical Proximity Correction Using Aerial Image Simulation and Newton Optimization Scheme 1996 Park, C. H.
Development of KrF Excimer Laser 1996 Mizoguchi, H.
Silicon Crystal Technology in the Sub-Quarter Micron Era 1996 Tsuya, H.
Current Issues and Future Challenges in High Density Plasma Etching 1996 Samukawa, S.
Improvement of Dry Etching Selectivity of Aluminum Alloy to Photoresist by Means of Ion Implantation 1996 Shibata, K.
Alle Artikel auflisten