Development of Highly Dry-etch-resistant Polymers for ArF Chemically Amplified Resists

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Veröffentlicht in:Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (53 : 1997 : Tokio) 53. Handōtai Shuseki Kairo Gijutsu Shinpojiumu Kōen Ronbunshū
1. Verfasser: Iwasa, S. (VerfasserIn)
Weitere Verfasser: Maeda, K. (VerfasserIn), Nakano, K. (VerfasserIn), Hasegawa, E. (VerfasserIn)
Pages:53
Format: UnknownFormat
Sprache:eng
Veröffentlicht: 1997
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Development of Highly Dry-etch-resistant Polymers for ArF Chemically Amplified Resists 1997 Iwasa, S.
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