High-k materials in multi-gate FET devices

"This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and relat...

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Bibliographische Detailangaben
Weitere Verfasser: Tayal, Shubham (HerausgeberIn), Singla, Parveen (HerausgeberIn), Davim, J. Paulo (HerausgeberIn)
Format: UnknownFormat
Sprache:eng
Veröffentlicht: Boca Raton, London, New York CRC Press, Taylor & Francis Group 2021
Ausgabe:First edition
Schriftenreihe:Science, technology, and management series
Schlagworte:
Online Zugang:Inhaltsverzeichnis
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Beschreibung
Zusammenfassung:"This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues"--
Beschreibung:Includes bibliographical references and index
Beschreibung:xii, 164 Seiten
Illustrationen, Diagramme
ISBN:9780367639686
978-0-367-63968-6
9780367639693
978-0-367-63969-3