Developments in surface contamination and cleaning series Volume 1 Fundamentals and applied aspects / edited by Rajiv Kohli and K. L. Mittal
The Physical Nature of Very, Very Small Particles and its Impact on their Behavior / Othmar Preining -- Transport and Deposition of Aerosol Particles / Daniel J. Rader and Anthony S. Geller -- Relevance of Particle Transport in Surface Deposition and Cleaning / Chao-Hsin Lin and Chao Zhu -- Aspects...
Gespeichert in:
| Weitere Verfasser: | , |
|---|---|
| Format: | UnknownFormat |
| Sprache: | eng |
| Veröffentlicht: |
Amsterdam, Boston, Heidelberg
William Andrews
2016
|
| Ausgabe: | Second edition |
| Schlagworte: | |
| Online Zugang: | Inhaltsverzeichnis und Leseprobe |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Tag hinzufügen | Zusammenfassung: | The Physical Nature of Very, Very Small Particles and its Impact on their Behavior / Othmar Preining -- Transport and Deposition of Aerosol Particles / Daniel J. Rader and Anthony S. Geller -- Relevance of Particle Transport in Surface Deposition and Cleaning / Chao-Hsin Lin and Chao Zhu -- Aspects of Particle Adhesion and Removal / David J. Quesnel, Donald S. Rimai, David M. Schaefer, Stephen P. Beaudoin, Aaron Harrison, Darby Hoss, Melissa Sweat, and Myles Thomas -- Tribological Implication of Particles / Koji Kato -- ESD Controls in Cleanroom Environments : Relevance to Particle Deposition / Larry Levit and Arnold Steinman -- Airborne Molecular Contamination : Contamination on Substrates and the Environment in Semiconductors and Other Industries / Taketoshi Fujimoto, Kikuo Takeda, and Tatsuo Nonaka -- Surface Analysis Methods for Contaminant Identification / David A. Cole, Sachin Attavar, and Lei Zhang -- Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles / Zhong Lin Wang and Jean L. Lee -- Wettability Techniques to Monitor the Cleanliness of Surfaces / Darren L. Williams and Kashmiri L. Mittal -- Cleaning with Solvents / John B. Durkee -- Removal of Particles by Chemical Cleaning / Philip G. Clark and Thomas J. Wagener -- The Use of Surfactants to Enhance Particle Removal from Surfaces / Michael L. Free -- Microabrasive Technology for Precision Cleaning and Processing / Rajiv Kohli -- Cleaning Using High-Speed Impinging Jet / Kuniaki Gotoh -- Carbon Dioxide Snow Cleaning / Robert Sherman -- Cleaning Using Argon/Nitrogen Cryogenic Aerosols / Wayne T. McDermott and Jeffery W. Butterbaugh -- Coatings for Prevention or Deactivation of Biological Contaminants / Joerg C. Tiller -- A Detailed Study of Semiconductor Wafer Drying / Wim Fyen, Frank Holsteyns, Twan Bearda, Sophia Arnauts, Jan Van Steenbergen, Geert Doumen, Karine Kenis, and Paul W. Mertens. |
|---|---|
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | xxii, 873 Seiten Illustrationen 23 cm |
| ISBN: | 9780323299602 978-0-323-29960-2 |