Dynamic Characterization and Robustness Test of High Voltage SiC MOSFETs

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:European Conference on Silicon Carbide and Related Materials (12. : 2018 : Birmingham) Silicon carbide and related materials 2018
1. Verfasser: Soler, V. (VerfasserIn)
Weitere Verfasser: Cabello, M. (VerfasserIn), Montserrat, V. Banu. J. (VerfasserIn), Rebollo, J. (VerfasserIn), Godignon, P. (VerfasserIn), Bianda, E. (VerfasserIn), Knoll, L. (VerfasserIn), Kranz, L. (VerfasserIn), Mihaila, A. (VerfasserIn)
Pages:2018
Format: UnknownFormat
Sprache:eng
Veröffentlicht: 2019
Schlagworte:
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Titel Jahr Verfasser
Cold Split Kerf-Free Wafering Results for Doped 4H-SiC Boules 2019 Gesell, M. Swoboda, R. Rieske, C. Beyer, A. Ullrich, G.
Study on N and B Doping by Closed Sublimation Growth Using Separated Ta Crucible 2019 Iwaya, D. Tanaka, H. Kurokawa, S. Kamiyama, T. Takeuchi, M.
Research on the Key Problems in the Industrialization of SiC Substrate Materials 2019 Liu, SA P. Gao, J. Xin, C. F. Yan, H. K. Kong, J. J. Chen, X. C.
High Quality 4H-SiC Epitaxial Layer by Tuning CVD Process 2019 Coffa, N. Piluso, A. Campione, S. Lorenti, A. Severino, G. Arena, S.
Evaluation of Basal Plane Dislocation Behavior in the Epitaxial Layer on a 4H-SiC Wafer Fabricated by the Solution Growth Method 2019 Harada, K. Seki, K. Kusunoki, S.
Extensive 99% Killer Defect Free 4H-SiC Epitaxial Layer toward High Current Large Chip Devices 2019 Doi, K. Wada, T. Miyase, H. Itoh, T. Hori, H.
Effect of Surface Etching Conditions on Stacking Faults in 4H-SiC Epitaxy 2019 Rana, T.
A Study of CVD Growth Parameters to Fill 50-pm-Deep 4H-SiC Trenches 2019 Yoshida, S. Y. Ji, R. Kosugi, K. Kojima, K. Adachi, Y. Kawada, K. Mochizuki, A. Nagata, Y. Matsukawa, Y. Yonezawa, S.
Vapor Growth of 3C-SiC Using the Transition Layer of 3C-SiC on Si CVD Templates 2019 Schuh, P.
Cryogenic Characterization of NH3 Post Oxidation Annealed 4H-SiC Trench MOSFETs 2019 Rescher, J. Berens, G. Pobegen, T. Aichinger, G.
Surface Morphology of 4H-SiC after Thermal Oxidation 2019 Woerle, J.
Evidence for an Abrupt Transition between SiOz and SiC from EELS and Ab Initio Modelling 2019 Cottom, J.
Detecting Basal Plane Dislocations Converted in Highly Doped Epilayers 2019 Nishihara, Y.
Initiation of Shockley Stacking Fault Expansion in 4H-SiC P-i-N Diodes 2019 Okada, A.
Effect of Defects in Silicon Carbide Epitaxial Layers on Yield and Reliability 2019 Das, H.
Evaluation of Effect of Mechanical Stress on Stacking Fault Expansion in 4H-SiC P-i-N Diode 2019 Goryu, A.
Effects of Aluminum Incorporation on the Young's Modulus of 3C-SiC Epilayers 2019 Messaoud, J. B.
4H-SiC p-Type Doping Determination from Secondary Electrons Imaging 2019 Kayambaki, M.
Relationship between Temperature Dependencies of Resistivity and Hall Coefficient in Heavily Al-Doped 4H-SiC Epilayers 2019 Matsuura, H.
Newly Resolved Phonon-Assisted Transitions and Fine Structure in the Low Temperature Wavelength Modulated Absorption and Photoluminescence Spectra of 6H SiC 2019 Klahold, W. M.
Alle Artikel auflisten