Chemical mechanical polishing 12 : [papers presented at the Twelfth Chemical Mechanical Polishing Symposium (CMP 12), conducted during 222nd meeting of the ECS in Honolulu, HI, in October 2012, which was part of PRiME 2012 (the Pacific Rim Meeting on Electrochemical and Solid-State Science), the joint international meeting of the Electrochemical Society and the Electrochemical Society of Japan, in Honolulu, Hawaii, from October 7 to 12, 2012]

Chemical mechanical polishing 12 [papers presented at the Twelfth Chemical Mechanical Polishing Symposium (CMP 12), conducted during 222nd meeting of the ECS in Honolulu, HI, in October 2012, which was part of PRiME 2012 (the Pacific Rim Meeting on Electrochemical and Solid-State Science), the joint international meeting of the Electrochemical Society and the Electrochemical Society of Japan, in Honolulu, Hawaii, from October 7 to 12, 2012]

Gespeichert in:
Bibliographische Detailangaben
Körperschaften: Denki-Kagakkai (BerichterstatterIn), Electrochemical Society Dielectric Science and Technology Division (BerichterstatterIn)
Weitere Verfasser: Rhoades, R. L. (BerichterstatterIn)
Format: UnknownFormat
Sprache:eng
Veröffentlicht: Pennington, NJ ECS, The Electrochemical Society 2013
Schriftenreihe:ECS transactions Dielectric and semiconductor materials, devices, and processing 50,39
Schlagworte:
Konferenzschrift > Polieren > Chemisches Polieren
Online Zugang:Inhaltsverzeichnis
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!

Keine Ergebnisse!