Application of an interferometric phase contrast method to fabricate arbitrary diffractive optical elements
A novel approach for the fabrication of diffractive optical elements is described. This approach is based on an interferometric phase contrast method that transforms a complex object wavefront into an intensity pattern. The resulting intensity pattern is used to expose a photoresist layer on a subst...
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| Veröffentlicht in: | Applied optics |
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| Weitere Verfasser: | , , , , |
| Format: | UnknownFormat |
| Sprache: | eng |
| Veröffentlicht: |
2008
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| Schlagworte: | |
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Tag hinzufügen | Zusammenfassung: | A novel approach for the fabrication of diffractive optical elements is described. This approach is based on an interferometric phase contrast method that transforms a complex object wavefront into an intensity pattern. The resulting intensity pattern is used to expose a photoresist layer on a substrate. After development, a diffractive phase object with an on-axis diffraction pattern is achieved. We show that the interferometric phase contrast method allows a precise control of the resulting intensity pattern. An array of blazed Fresnel lenses is realized in photoresist by using kinoform or detour-phase computer holograms for the interferometric phase contrast setup. |
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| ISSN: | 1559-128X |