Silicon nitride, silicon dioxide thin insulating films, and other emerging dielectrics VIII : proceedings of the international symposium ; [proceedings of the Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and other Emerging Dielectrics to be held May 16 - 20, 2005 in Québec City as a part of the 207th meeting of the Electrochemical Society (ECS)]

Silicon nitride, silicon dioxide thin insulating films, and other emerging dielectrics VIII proceedings of the international symposium ; [proceedings of the Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and other Emerging Dielectrics to be held May 16 - 20, 2005 in Québec City as a part of the 207th meeting of the Electrochemical Society (ECS)]

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Bibliographische Detailangaben
Körperschaften: Electrochemical Society Dielectric Science and Technology Division (BerichterstatterIn), Electrochemical Society Electronics Division (BerichterstatterIn), Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and other Emerging Dielectrics (BerichterstatterIn)
Weitere Verfasser: Sah, Ram Ekwal (BerichterstatterIn)
Format: UnknownFormat
Sprache:eng
Veröffentlicht: Pennington, NJ Electrochemical Society 2005
Schriftenreihe:Proceedings volume / Electrochemical Society 2005-1
Schlagworte:
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