Number Concentration and Size Distribution of SiO, Particles Near a Heated Wafer in a Low-Pressure SiH4: O2: He CVD Reactor: Comparison of Experimental and Numerical Results

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Veröffentlicht in:Earozoru Kagaku, Gijutsu Kenkyū Tōronkai (10. : 1993 : Muroran) Dai 10kai Earozoru Kagaku, Gijutsu Kenkyū Tōronkai
1. Verfasser: Whitby, E. (VerfasserIn)
Weitere Verfasser: Hoshino, M. (VerfasserIn), Tsuzuki, K. (VerfasserIn)
Pages:10
Format: UnknownFormat
Sprache:eng
Veröffentlicht: 1993
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