| Focused Ion Beam Processing
|
1988 |
Namba, Susumu |
| Ion Induced Metastable Phase Formation
|
1988 |
Mayer, J. W. |
| Ion-Scattering Analysis of Semiconductor Films
|
1988 |
Marée, P. M. J. |
| Surface Modification of Metals by Ion Implantation
|
1988 |
Iwaki, Masaya |
| Ion Beam Studies of Thin Film Growth Processes
|
1988 |
Feldman, L. C. |
| Multidimensional Elemental Analysis with the Sandia Nuclear Microprobe
|
1988 |
Doyle, B. L. |
| Use of RBS Technique in Applications of Silicides in VLSI
|
1988 |
Murarka, S. P. |
| Selective Doping of B and P Ions in Lateral Solid Phase Epitaxy of Amorphous Si
|
1988 |
Ishiwara, Hiroshi |
| Application of Focused Ion Beam Technique in VLSI Development
|
1988 |
Yasue, T. |
| Focused Ion Beam Lithography System
|
1988 |
Kasahara, H. |
| An in-situ RBS Study of TiN Formation on top of TiSi2
|
1988 |
Kuiper, A. E. T. |
| Ion-Induced Interfacial Reaction of Chromium Carbide Deposited on Graphite at High Temperatures
|
1988 |
Hasebe, Y. |
| A Systematic Study on the Lattice Site Occupation of Metallic Elements Implanted into Aluminium
|
1988 |
Meyer, 0. |
| Accelerator Mass Analyses of Meteorites -- Carbon-14 Terrestrial Ages
|
1988 |
Miura, Y. |
| Trace Element Analysis of Sea Water by PIXE
|
1988 |
Ishikawa, Masafumi |
| Application of PIXE to Biological Materials in Daily Life
|
1988 |
Maeda, K. |
| The RBS Analysis of Impurities in Deuteron Beam
|
1988 |
Liu, Y. C. |
| Evaluation of Crystalline Quality of Zirconium Dioxide Films on Silicon by Means of Ion Beam Channeling
|
1988 |
Nishibayashi, Yoshiki |
| Channeling Study of Proton Irradiation Damage in 3C-SiC
|
1988 |
Nashiyama, I. |
| Buried Insulating Layers in Silicon by Ion Implantation
|
1988 |
Stephens, K. G. |
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