LIFETIME EVALUATION OF METALLIC CONTAMINATION ON Si WAFERS AND OXIDATION ENHANCEMENT BY CONTAMINATION

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Veröffentlicht in:Handōtai, Shūseki Kairo Gijutsu Shinpojiumu (33. : 1987 : Tokio) Handōtai, Shūseki Kairo Gijutsu Dai 33kai Shinpojiumu
1. Verfasser: Atsumi, J. (VerfasserIn)
Weitere Verfasser: Kosaki, Y. (VerfasserIn), Kajiyama, K. (VerfasserIn)
Pages:33
Format: UnknownFormat
Sprache:jpn
Veröffentlicht: 1987
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Titel Jahr Verfasser
CHARACTERISTICS OF MOSFET’S ON LARGE GRAIN POLYSILICON FILMS 1987 Katoh, T.
METAL CONTAMINATION INDUCED BY PHOTORESIST ASHING 1987 Hashiguchi, T.
CHARACTERISTICS OF MOLYBDENUM SILICIDE MASK (OPTICAL PROPERTIES OF THIN FILM) 1987 Chiba, A.
Al–4%Cu DRY ETCHING TECHNOLOGY 1987 Samukawa, S.
FOCUSED PHOSPHORUS ION BEAM IMPLANTATION INTO Si 1987 Madokoro, Y.
PATTERN DEFORMATION DURING SILICON EPITAXIAL GROWTH 1987 Masui, S.
LIFETIME EVALUATION OF METALLIC CONTAMINATION ON Si WAFERS AND OXIDATION ENHANCEMENT BY CONTAMINATION 1987 Atsumi, J.
STRESS DISTRIBUTION IN Si SUBSTRATES WITH TRENCH FILLED BY SiO2 1987 Sakuma, K.
WET ETCHING MECHANISMS OF ALUMINIUM ELECTRODES UNDER THE LOW PRESSURE —Linewidth Narrowing Troubles— 1987 Uchiyama, M.
DOPING OF TRENCH SIDEWALLS BY OBLIQUE-ROTATING ION IMPLANTATION 1987 Ohsaki, S.
CHARACTERIZATION OF Ta2O5 THIN FILMS FORMED BY ION BEAM METHOD 1987 Ohnishi, T.
EXCIMER PHOTO – LITHOGRAPHY PROCESS 1987 Tanaka, H.
RECENT ACTIVITIES IN PROCESS SIMULATION 1987 Fukuma, M.
SILICON TRENCH ETCHING BY SiCl4 PROCESS 1987 Kadomura, S.
MODELING OF ABNORMAL BORON DIFFUSION DURING RAPID THERMAL PROCESSING 1987 Sakamoto, K.
SELECTIVE CVD – TUNGSTEN USING SiH4 – REDUCTION AND ITS APPLICATION TO VLSI 1987 Tsutsumi, T.
PERFORMANCE OF VERTICAL LP CVD APPARATUS USING POLY Si DEPOSITION 1987 Mino, Y.
HIGH-ENERGY (MeV) ION IMPLANTATION INTO SEMICONDUCTORS –REVIEW OF PRESENT STATUS AND FUTURE PROBLEMS– 1987 Tokuyama, T.
CHANGES OF IMPURITY PROFILES CAUSED BY RADIATION EFFECT AND OXYGEN DONORS 1987 Takagi, K.
HIGH RESOLUTION POSITIVE PHOTORESIST 1987 Yoshimi, T.
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