Kinetic Study on the Si3N4 Etching in Superheated Water

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV
1. Verfasser:	Son, C. (VerfasserIn)
Weitere Verfasser:	Lim, S. (VerfasserIn)
Format:	UnknownFormat
Sprache:	eng
Veröffentlicht:	2021
Schlagworte:
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Bestellen

Titel	Jahr	Verfasser
Cl-Containing Microplastics from the Environment	2021	Knotter, D. M.
Experimental Wafer Carrier Contamination Analysis and Monitoring in Fully Automated 300 mm Power Production Lines	2021	Zängle, C.
Wet Chemical Cleaning of Organosilane Monolayers	2021	Hinckley, A. P.
Si1-XGeX Selective Etchant for Gate-All-Around Transistors	2021	Harada, K.
GaN MOS Structures with Low Interface Trap Density (Invited)	2021	Chu, R. M.
Formulation and Evaluation of Diluted Sulfuric-Peroxide-HF (DSP+) Mixtures for Cleaning High-Aspect Ratio Contacts in 3D NAND	2021	An, K. H.
Breakthrough of Sublimation Drying by Liquid Phase Deposition	2021	Sasaki, Y.
New Test Structure Development for Pattern Collapse Evaluations	2021	Xu, X. M.
Estimation of the Generation Rate of H· Radicals in a Megasonic Field Using an Electrochemical Technique	2021	Han, Z. X.
Ultrafine Particle Removal in the Wafer Cleaning Process Using an Aqueous Solution with a High Concentration of Dissolved O3 and HF	2021	Han, H. J.
Scalable Particle Removal for sub-5 nm Nodes	2021	Yoshida, Y.
Tribological Characterization of Anionic Supramolecular Assemblies in Post-STI-CMP Cleaning Solution Using a Novel Post-CMP PVA Brush Scrubber	2021	Philipossian, A.
Removal of Post Etch Residue on BEOL Low-K with Nanolift	2021	Akanishi, Y.
Selective Nickel Platinum Removal without Titanium Nitride Metal Gate Corrosion	2021	Garnier, P.
Selective Ru or Co Etch for 3nm Applications	2021	Hsu, C. P. S.
Remote Plasma Etching of Backend Semiconductor Materials for Reliable Packaging	2021	Evertsen, R.
Investigation of Contaminants in Single Wafer Wet Cleaning Using Isopropyl Alcohol	2021	Oh, S.
Reaction Kinetics of Poly-Si Etching in TMAH Solution	2021	Park, T.
Effect of Surface Oxidation on the Material Loss of InGaAs in Acidic Solutions	2021	Na, J.
Silicon Corrosion during Selective Silicon Nitride Etch with Hot Diluted Hydrofluoric Acid	2021	Garnier, P.

Alle Artikel auflisten