Cl-Containing Microplastics from the Environment

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Bibliographische Detailangaben
Veröffentlicht in:	International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV
1. Verfasser:	Knotter, D. M. (VerfasserIn)
Weitere Verfasser:	Sharma, P. (VerfasserIn), Goumans, L. (VerfasserIn)
Format:	UnknownFormat
Sprache:	eng
Veröffentlicht:	2021
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Titel	Jahr	Verfasser
Cl-Containing Microplastics from the Environment	2021	Knotter, D. M.
Experimental Wafer Carrier Contamination Analysis and Monitoring in Fully Automated 300 mm Power Production Lines	2021	Zängle, C.
Wet Chemical Cleaning of Organosilane Monolayers	2021	Hinckley, A. P.
Si1-XGeX Selective Etchant for Gate-All-Around Transistors	2021	Harada, K.
GaN MOS Structures with Low Interface Trap Density (Invited)	2021	Chu, R. M.
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Breakthrough of Sublimation Drying by Liquid Phase Deposition	2021	Sasaki, Y.
New Test Structure Development for Pattern Collapse Evaluations	2021	Xu, X. M.
Estimation of the Generation Rate of H· Radicals in a Megasonic Field Using an Electrochemical Technique	2021	Han, Z. X.
Ultrafine Particle Removal in the Wafer Cleaning Process Using an Aqueous Solution with a High Concentration of Dissolved O3 and HF	2021	Han, H. J.
Scalable Particle Removal for sub-5 nm Nodes	2021	Yoshida, Y.
Tribological Characterization of Anionic Supramolecular Assemblies in Post-STI-CMP Cleaning Solution Using a Novel Post-CMP PVA Brush Scrubber	2021	Philipossian, A.
Removal of Post Etch Residue on BEOL Low-K with Nanolift	2021	Akanishi, Y.
Selective Nickel Platinum Removal without Titanium Nitride Metal Gate Corrosion	2021	Garnier, P.
Selective Ru or Co Etch for 3nm Applications	2021	Hsu, C. P. S.
Remote Plasma Etching of Backend Semiconductor Materials for Reliable Packaging	2021	Evertsen, R.
Surface Cleaning Challenges for Organic Light Emitting Diodes (Invited)	2021	Giebink, N.
Characterization and Removal of Metallic Contamination in H2O and H2O2 Using Single Particle Inductively Coupled Plasma Mass Spectrometry	2021	Sampath, S.
Wafer Container Monitoring Concerning Airborne Molecular Contaminations along a 300 mm Power Semiconductor Production Flow	2021	Franze, P.
Analysis of Surface Reaction for Group III-V Compound Semiconductors in Functional Water	2021	Nishio, K.

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