Influence of Etching Regimes on the Reflectance of Black Silicon Films Formed by Ni-Assisted Chemical Etching

Influence of Etching Regimes on the Reflectance of Black Silicon Films Formed by Ni-Assisted Chemical Etching

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Veröffentlicht in:Asian School-Conference on Physics and Technology of Nanostructured Materials (4. : 2018 : Wladiwostok) Physics and technology of nanostructured materials IV (supplement book)
1. Verfasser: Volovlikova, O. V. (VerfasserIn)
Weitere Verfasser: Gavrilov, S. A. (VerfasserIn), Lazarenko, P. I. (VerfasserIn), Kukin, A. V. (VerfasserIn), Dudin, A. A. (VerfasserIn), Tarhanov, A. K. (VerfasserIn)
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Sprache:eng
Veröffentlicht: 2019
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