Policy of the Central Bank under the floating exchange rate system in Japan

von Yoshino, T.
Veröffentlicht in Floating exchange rates (1976)

Central banking in Japan

von Yoshino, T.
Veröffentlicht in The bankers' magazine (1967)

Influence of Light Irradiation on Semiconductor-Surface Cleaning Technology and Its Application to Surface Cleaning - Suppression of Natural Oxidation of Si Wafer by Screening of L...

von Yoshino, T.
Veröffentlicht in Ēarozoru-Kagaku-Gijutsu-Kenkyū-Tōronkai (17 : 2000 : Higashihiroshima) 17.-Earozoru-kagaku-gijutsu-kenkyū-tōronkai (2000)

Near-Net Forging of Titanium and Titanium Alloys by the Plasma Carburized SKD11 Dies

von Aizawa, T.
Veröffentlicht in International Conference on Material Forming (25. : 2022 : Braga) Achievements and trends in material forming ; Part 2 (2022)

Ultra Clean Technology Using UV/photoelectron Method for Semiconductor Manufacturing and Its Effect on MOS Devices

von Yoshino, T.
Veröffentlicht in Ēarozoru-Kagaku-Gijutsu-Kenkyū-Tōronkai (17 : 2000 : Higashihiroshima) 17.-Earozoru-kagaku-gijutsu-kenkyū-tōronkai (2000)

BOUNDARY-LAYER COMBUSTION OF WAX-BASED FUELS AT VARIOUS CHAMBER PRESSURES UNDER TWO STATIC ACCELERATION ENVIRONMENTS

von Ozawa, K.
Veröffentlicht in AIAA Propulsion and Energy Forum (2019 : Indianapolis, Ind.) Hybrid rockets (2019)

5661 New Corrosion Inhibition Approach Under High Corrosive Environment in Cooling Water Systems

von Kuribara, Takeshi
Veröffentlicht in Corrosion Conference and Expo 2015 ; Vol. 1 (2015)

Influence of organic contamination on electronic characteristics of MOS transistors

von Yokoyama, S.
Veröffentlicht in Ēarozoru-Kagaku-Gijutsu-Kenkyū-Tōronkai (19 : 2002 : Kyōto) 19.-Earozoru-kagaku, gijutsu-kenkyū-tōronkai (2002)

Hybrid Low-k/Cu Damascene Process for 45-32 nm Technology Node Using Self-Assembled Porous-Silica Ultra Low-k Films

von Chikaki, S.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (69 : 2005 : Tokio) Handōtai, Shuseki-Kairo-Gijutsu-69.-Shinpojiumu-kōen-ronbunshū (2005)