Effect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics

von Han, S. Y.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)

Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process

von Sahir, S.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)

Effect of Dissolved Oxygen on Removal of Benzotriazole from Co during a Post-Co CMP Cleaning

von Ryu, H. Y.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)

Formulation and Evaluation of Diluted Sulfuric-Peroxide-HF (DSP+) Mixtures for Cleaning High-Aspect Ratio Contacts in 3D NAND

von An, K. H.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)