Observation of non-uniformity of space potential on magnetic surfaces in helical nonneutral plasmas

Veröffentlicht 2005

Kofu

Veröffentlicht 1888

Idzu

Veröffentlicht 1884

Sub-10-nm Planar-Bulk-CMOS Device Properties

von Wakabayashi, H.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (68 : 2005 : Kyōto) Handōtai, Shuseki-Kairo-Gijutsu-68.-Shinpojiumu-kōen-ronbunshū (2005)

Highly Oriented Growth of Al;Sci.x N Ferroelectric Film on W Bottom Electrodes

von Tsai, S.
Veröffentlicht in Pacific Rim Meeting on Electrochemical and Solid State Science (2020 : Online) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences (2020)

Radiation emission rate of PET acquisition in routine whole-body 18F-FDG PET-CT procedures

von Canfizares, H. G.
Veröffentlicht in International Conference on Isotopes (10. : 2020 : Kuala Lumpur) Harnessing isotopes for improved quality of life (2020)

Gate Electrode Technologies for Sub-100nm CMOS Devices - SiGe and Metal Gate

von Yamamoto, T.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (60 : 2001 : Osaka) Handōtai, Shuseki-Kairo-Gijutsu-60.-Shinpojiumu-kōen-ronbunshū (2001)

Electrical Characteristics of Atomic Layer Deposited Y-Silicate Dielectrics

von Ohta, A.
Veröffentlicht in Pacific Rim Meeting on Electrochemical and Solid State Science (2020 : Online) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences (2020)

Wetland Forest Observation and Its Biomass Estimation in Kushiro Wetland by using Multipolarization SAR Data

von Nakamura, K.
Veröffentlicht in 2006 IEEE International Geoscience and Remote Sensing Symposium ; Vol. 7 (2006)

Evaluation of Mo(1-x) Wrs Alloy Fabricated By Combinatorial Film Deposition

von Hanafusa, S.
Veröffentlicht in Symposium "Semiconductors, Dielectrics, and Metals for Nanoelectronics" (18. : 2021 : Online) Semiconductors, Dielectrics, and Metals for Nanoelectronics 18 (2021)

Body Potential Design Using Narrow and Shallow Halo to Reduce the Floating Body Effect of SOI-MOSFET

von Koh, R.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (63 : 2002 : Tokio) Handōtai, Shuseki-Kairo-Gijutsu-63.-Shinpojiumu-kōen-ronbunshū (2002)

Effect of Growth Parameters on MoS2 Film Quality Deposited by Low-Temperature MOCVD Using I-Pr2dadmo(CO)3 and (t-C4H9)2S2

von Kirito, C.
Veröffentlicht in Symposium "Semiconductors, Dielectrics, and Metals for Nanoelectronics" (18. : 2021 : Online) Semiconductors, Dielectrics, and Metals for Nanoelectronics 18 (2021)

Ferroelectric HfO2 Capacitors for Varactor Application in GHz

von Lin, Y.
Veröffentlicht in Pacific Rim Meeting on Electrochemical and Solid State Science (2020 : Online) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences (2020)

High-Performance CMOS Device Technologies Featuring Metal/High-k Gate Electrodes with Uniaxially-Strained Silicon Channels on (100) and (110) Substrates

von Wakabayashi, H.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-71.-Shinpojiumu-kōen-ronbunshū (2007)