Highly Reliable Gate Oxides Formed by UV-O2 Oxidation

von Teramoto, A.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (51 : 1996 : Tokio) 51. Handōtai Shuseki Kairo Gijutsu Shinpojiumu Kōen Ronbunshū (1996)

Non-Porous Low-k Fluorocarbon Films for 45nm Generation Formed by Very Low Electron Temperature Plasma

von Miyatani, K.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (68 : 2005 : Kyōto) Handōtai, Shuseki-Kairo-Gijutsu-68.-Shinpojiumu-kōen-ronbunshū (2005)

Control of Nitrogen Depth Profile in Radical Nitrided Silicon Oxide Film

von Kawase, K.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (67 : 2004 : Tokio) Handōtai, Shuseki-Kairo-Gijutsu-67.-Shinpojiumu-kōen-ronbunshū (2004)