A considerationofphenomenal “parallel” and “equidistance” of ISLES model with measurement scale in psychometric method

von MAEDA, T.
Veröffentlicht in Nihon Shinkei Kairo Gakkai (5. : 1994 : Tsukuba) JNNS’ 94 Tsukuba (1994)

Chemical and Physical Roles of Individual Reactive Ions in Si Dry Etching

von TACHI, S.
Veröffentlicht in Conference on Solid State Devices (13 : 1981 : Tokio) Proceedings of the 13th Conference on Solid State Devices (1982)

A TWO–DIMENSIONAL ETCHING PROFILE SIMULATOR : ESPRIT

von Yamamoto, S.
Veröffentlicht in Handōtai, Shūseki Kairo Gijutsu Shinpojiumu (30. : 1986 : Tokio) Handōtai, Shūseki Kairo Gijutsu Dai 30kai Shinpojiumu (1986)