Carrier Concentration of CeFe2Al10 as a Candidate of Thermoelectric Material

von Kawamura, Y.
Veröffentlicht in International Conference on Processing and Manufacturing of Advanced Materials: Processing, Fabrication, Properties, Applications (11. : 2021 : Wien) THERMEC 2021 ; Part 1 (2021)

Delamination of Thin Si and SiC Layers by The H*implantation

von Hara, T.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (52 : 1997 : Osaka) 52. Handōtai Shuseki Kairo Gijutsu Shinpojiumu Kōen Ronbunshū (1997)

Impact of Very Low Hf Concentration (Hf=6%) Cap Layer on Performance and Reliability Improvement of HISION-CMOSFET with EOT Scalable to 1nm

von Sato, M.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-71.-Shinpojiumu-kōen-ronbunshū (2007)