Ultra-Thin Gate Dielectric Film Formation Technology by using Microwave-Exceitation High-Density Plasma

von SEKINE, Katsuyuki
Veröffentlicht in Chō-LSI-Urutora-Kurīn-Tekunorojī-Shinpojiumu (33 : 1999 : Tokio) Cho-LSI-Urutora-Kurin-Tekunoroji-Shinpojiumu (1999)