(Invited) Si-Cap-Free Low-Dir SiGe Gate Stack for High-Performance pFETs

von Arimura, H.
Veröffentlicht in Pacific Rim Meeting on Electrochemical and Solid State Science (2020 : Online) (9.) SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 9 (2020)

Towards Si-Cap-Free SiGe Passivation: Impact of Surface Preparation on Low-Pressure Oxidation of SiGe

von Wostyn, K.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)

Challenges and Solutions of Replacement Metal Gate Patterning to Enable Gate-all-Around Device Scaling

von Oniki, Y.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)

Integrating Hf-based high-k gate stacks with polysilicon gates

von Gendt, S. De
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (64 : 2003 : Osaka) Handōtai, Shuseki-Kairo-Gijutsu-64.-Shinpojiumu-kōen-ronbunshū (2003)