Evaluation of Plasma-Induced Damages to Thin Oxides During Polysilicon Gate Etching in Gas-Puff Chlorine Plasmas

von Tomohisa, S.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (56 : 1999 : Osaka) 56.-Handōtai-Shuseki-Kairo-Gijutsu-Shinpojiumu-kōen-ronbunshū (1999)