High-Performance CMOS Device Technologies Featuring Metal/High-k Gate Electrodes with Uniaxially-Strained Silicon Channels on (100) and (110) Substrates

von Wakabayashi, H.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-71.-Shinpojiumu-kōen-ronbunshū (2007)