High-k/Metal Gate CMOS — Development Status and Issues

von Nara, Y.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-74.-Shinpojiumu-kōen-ronbunshū (2010)

Experimental Study of Amorphous Silicon Integrated Circuit

von NARA, Y.
Veröffentlicht in Conference on Solid State Devices (13 : 1981 : Tokio) Proceedings of the 13th Conference on Solid State Devices (1982)

Synchrotron Radiation-excited Low-temperature Epitaxy of Silicon

von Sugita, Y. Nara. Y.
Veröffentlicht in Handōtai, Shūseki Kairo Gijutsu Shinpojiumu (42. : 1992 : Tokio) Handōtai, Shūseki Kairo Gijutsu Dai 42kai Shinpojiumu (1991)

Advanced BEOL Integration using Non-Porogen Low-k Materials

von Owada, T.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-73.-Shinpojiumu-kōen-ronbunshū (2009)

Mechanisms of Effective Work Function Modulation of Metal/Hf-based High-k Gate Stacks

von Watanabe, H.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-72.-Shinpojiumu-kōen-ronbunshū (2008)

Gate-first Metal Gate/Dual High-k CMOS with Low Threshold Voltages

von Nara, Y.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-72.-Shinpojiumu-kōen-ronbunshū (2008)

Experimental Study on Improvement of the Fermi-level Pinning in Metal/HfSiON Gate Stack

von Kadoshima, M.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-71.-Shinpojiumu-kōen-ronbunshū (2007)