Impacts of Residual Chlorine in CVD-TiN Gate Electrode on the Gate Oxide Relhiability

von Moriwaki, M.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (59 : 2000 : Tokio) Handōtai, Shuseki-Kairo-Gijutsu-59.-Shinpojiumu-kōen-ronbunshū (2000)

Effects of the Sputtering Deposition of Metal Gate Electrode on the Gate Dielectric Characteristics

von Yamada, T.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (58 : 2000 : Tokio) 58.-Handōtai-Shuseki-Kairo-Gijutsu-Shinpojiumu-kōen-ronbunshū (2000)

Preparation and Characterization of High-K Gate Dielectric Films by Reactive Sputtering

von Hayashi, S.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (60 : 2001 : Osaka) Handōtai, Shuseki-Kairo-Gijutsu-60.-Shinpojiumu-kōen-ronbunshū (2001)