Gate-first Metal Gate/Dual High-k CMOS with Low Threshold Voltages

von Nara, Y.
Veröffentlicht in Handōtai, Shuseki-Kairo-Gijutsu-72.-Shinpojiumu-kōen-ronbunshū (2008)

Thin-Film SOFC Enabling Low-Temperature and Low-Hydrogen-Concentration Operation

von Sasago, Y.
Veröffentlicht in International Symposium on Solid Oxide Fuel Cells (17. : 2021 : Online) Solid Oxide Fuel Cells 17 (SOFC-XVII) ; Part 1 of 3 (2021)

Thin-Film SOFC Enabling Low-Temperature and Low-Hydrogen-Concentration Operation

von Sasago, Y.
Veröffentlicht in International Symposium on Solid Oxide Fuel Cells (17. : 2021 : Online) Solid Oxide Fuel Cells 17 (SOFC-XVII) ; Part 2 of 3 (2021)

Development of Fully Silicided Gate Technology in Metal/High-k MOSFETs

von Nabatame, T.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (68 : 2005 : Kyōto) Handōtai, Shuseki-Kairo-Gijutsu-68.-Shinpojiumu-kōen-ronbunshū (2005)