Characteristics of PVD-HfO2 with Poly-Si and Fully Silicided Gates

von Hayashi, S.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (68 : 2005 : Kyōto) Handōtai, Shuseki-Kairo-Gijutsu-68.-Shinpojiumu-kōen-ronbunshū (2005)

Integrating Hf-based high-k gate stacks with polysilicon gates

von Gendt, S. De
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (64 : 2003 : Osaka) Handōtai, Shuseki-Kairo-Gijutsu-64.-Shinpojiumu-kōen-ronbunshū (2003)