Evaluation of Silicon Nitride Film Formed by Atomic Layer Deposition on the Silicon Substrate with Trench Structure Using Angle-Resolved Hard X-ray Photoelectron Spectroscopy

von Nishihara, T.
Veröffentlicht in Pacific Rim Meeting on Electrochemical and Solid State Science (2020 : Online) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences (2020)

Nanocarbon interconnect technology

von Sakai, T.
Veröffentlicht in Handōtai, Shuseki Kairo Gijutsu dai 78-kai Shinpojiumu kōen ronbunshū (2014)