The Behavior of Particles in Liquid Chemicals and Their Deposition Control onto Silicon Wafer Surfaces

von KEZUKA, Takehiko
Veröffentlicht in Advanced wet chemical processing IV (1993)

The Control of Etching Rate for Various SiO2 Films

von KEZUKA, TaKkehiko
Veröffentlicht in Chō-LSI-Urutora-Kurīn-Tekunorojī-Shinpojiumu (33 : 1999 : Tokio) Cho-LSI-Urutora-Kurin-Tekunoroji-Shinpojiumu (1999)