Highly Selective Etching between Different Oxide Films by Vapor Phase Cleaning

von Nishihara, K.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)

Moduli spaces of stable sheaves on schemes : restriction theorems, boundedness and the GIT construction

von Maruyama, Masaki
Veröffentlicht 2016

Removal of SOC Hard Mask for Patterning of Work Function Metal by Thermally Activated Ozone Gas

von Iwahata, S.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)

Measurement of Oxygen Precipitation in Denuded Zone in Silicon Wafer by Low-Temperature Infrared Absorption

von Inaba, M.
Veröffentlicht in Handōtai, Shūseki Kairo Gijutsu Shinpojiumu (43. : 1992 : Tokio) Handōtai, Shūseki Kairo Gijutsu Dai 43kai Shinpojiumu (1992)

Scalable Particle Removal for sub-5 nm Nodes

von Yoshida, Y.
Veröffentlicht in International Symposium on Ultra Clean Processing of Semiconductor Surfaces (15. : 2021 : Mecheln) Ultra clean processing of semiconductor surfaces XV (2021)