Mobility Reduction due to Remote Charge Scattering in AI203/SiO2 Gate-Stacked MISFETs

von Saito, S.
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (63 : 2002 : Tokio) Handōtai, Shuseki-Kairo-Gijutsu-63.-Shinpojiumu-kōen-ronbunshū (2002)

Integrating Hf-based high-k gate stacks with polysilicon gates

von Gendt, S. De
Veröffentlicht in Handōtai-Shūseki-Kairo-Gijutsu-Shinpojiumu (64 : 2003 : Osaka) Handōtai, Shuseki-Kairo-Gijutsu-64.-Shinpojiumu-kōen-ronbunshū (2003)